The "SV Sputtering Process" developed originally bay Sanyo Vacuum is the only sputtering method in the world, featuring a double bell-jar and a jig rotating mechanism.
Sanyo Vacuum has acquired a patent on a manufacturing method in 1987.
High-volume production of high-quality thin films
The method is best suited for high-volume production of high-quality thin films, since it features the high-speed processing associated with the DC magnetron method and the versatility for sputtering materials associated with the RF magnetron method.
Large Dimension, High Density Thin Film Coating
In addition, adoption of a large-capacity chamber ensures easy handling of substrates having a large surface area.
Further, due to the substrate rotation mechanism, high density and uniformity of thin films can be formed by applying multiple layers, which is one of the important features.
Products
These origianl technologies as successively developed have enabled us to offer higher-quality, higher-resolution capability for flat panes displays.
- Quality Assurance
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- SV Sputtering Process
- Analysis Instruments
Roll to roll ITO･metal deposition 
